Description of the activity
Holographic lithography (HL) is used for sub-micron period resist patterning and electric overpoling for surface domain reversal. Surface structures are obtained by selective etching allowing nanoscale periodic surface structuring of congruent LiNbO3.
Unsteady liquid structures, shaped in polymeric liquids by an electrohydrodynamic pressure, can be rapidly cured by appropriate thermal treatments. We have developed a new approach that exploits instabilities and self-assembling of polymeric liquids for fabricating single or arrays of complex high aspect-ratio 3D microstructures. Liquid instabilities are first driven via EHD pressure and then quickly cured to obtain permanent 3D microstructures, by the same thermal treatment, paving the way to a previously undescribed “3D lithography concept/platform,” in which nanoliquid instabilities could be “fluidynamically” designed a priori with the aim at fabricating even more complex shapes exploitable in many fields from the micro to the macro scale.
- LAB. Interferometric lithography,
- Holographic and photorefractive lithography,
- LAB. Micro-printing and nanoliquid,
- Lab. characterization of samples,
- Spin coater Laurell WS-650Sz,
- pyro-EHD setup,
- HL setup,